Betriebsurlaub
Wir haben vom 24.12.2021.- 10.01.2022 Betriebsurlaub. Während dieser Zeit ist unser Büro nicht besetzt und es findet kein Versand statt. Ihre Anfragen und Aufträge bearbeiten wir gerne wieder ab dem 10.01.2022.
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The Solar Energy Technologies Office Fiscal Year 2020 Perovskite Funding Program has choosen nTact
We are proud to announce that nTact/ FAS Holdings Group was recently selected by the DOE for a Perovskite-Silicon Tandem Cell Development Project.
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Founder John P. Kummer passed away
We are sorry to announce the passing of our dear friend and the founder of our group of companies, Hans-Peter ‘John’ Kummer.
John was legendary in the semiconductor equipment business and was known and respected around the world. He founded John P Kummer AG in Zug, Switzerland in 1975 and the rest, as they say, is history.
John: Your warmth, wisdom and diplomatic skills will never be replaced.
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Frohe Weihnachten und ein schönes Neues Jahr!
Vom 24.12.2020 - 06.01.2021 ist unser Betrieb geschlossen.
Wir wünschen Ihnen Frohe Weihnachten und ein erfolgreiches neues Jahr!
Vielen Dank für die Zusammenarbeit in diesem turbulenten Jahr!
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FP Series - Large Area Contact Profilometry
FP Series
Large Area Contact Profilometry
This is custom Toho custom profilers offer comprehensive measurement capabilities for mass production and research facilities that demand accuracy, performance, and value.
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TS 3100 Film Thickness Measurement
TohoSpec 3100
Accurate Film Thickness Measurement
The TohoSpec 3100 is a low cost film thickness measurement system that utilizes a modern small spot spectroscopic reflectometer built on a simple-to-use tabletop platform. Incorporating core technology acquired from market leader Nanometrics, this system is specifically designed for a wide variety of R&D applications.
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FLX-3300-R Automated Stress Measurement
FLX Series
Precision Surface Stress Analysis
With thermal cycling and ambient auto-rotation models available, the Toho FLX Thin Film Stress Measurement Systems offer Industry Standard capabilities for mass production and research facilities that demand accurate stress measurements on various films and substrates. Incorporating KLA-Tencor’s patented “Dual Wavelength” technology, Toho FLX Series tools precisely determine and analyze surface stress caused by deposited thin films.
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FLX 3300-T Thermal Measurement System
FLX Series
Precision Surface Stress Analysis
With thermal cycling and ambient auto-rotation models available, the Toho FLX Thin Film Stress Measurement Systems offer Industry Standard capabilities for mass production and research facilities that demand accurate stress measurements on various films and substrates. Incorporating KLA-Tencor’s patented “Dual Wavelength” technology, Toho FLX Series tools precisely determine and analyze surface stress caused by deposited thin films.
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FLX2320-R Automated Stress Measurement System
FLX Series
Precision Surface Stress Analysis
With thermal cycling and ambient auto-rotation models available, the Toho FLX Thin Film Stress Measurement Systems offer Industry Standard capabilities for mass production and research facilities that demand accurate stress measurements on various films and substrates. Incorporating KLA-Tencor’s patented “Dual Wavelength” technology, Toho FLX Series tools precisely determine and analyze surface stress caused by deposited thin films.
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HL9900 Hall Effect Measurement
Toho HL9900
Hall Effect Measurement
HL9900 is a turnkey, high performance hall effect system for the measurement of resistivity, carrier concentration, and mobility in semiconductors. Modular in concept, allowing easy upgrade paths, the system is suitable for a wide variety of materials, including silicon and compound semiconductors. HL9900 has both low and high resistivity measurement capabilities.
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