Baublys Laser GmbH
Submitted by Anna Schwarz on Tue, 04/21/2015 - 12:08
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ISO 10993 Certification for Biocompatible Adhesives - EPO-TEK® 353ND-T, OG 198-54 and 301
(Billerica, MA) – April, 2015 - Epoxy Technology Inc, a leading manufacturer of high performance specialty epoxy, UV & Hybrid adhesives for 49 years, is pleased to announce the successful completion of ISO 10993 testing on three additional products. These latest positive results for EPO-TEK® 353ND-T, OG 198-54 and 301, which included an extended, long term implantation study of 12 weeks for 301 show their commitment and investment in the medical industry.
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ULTRA TEC: ARC-lite Antireflective Coater
Antireflective backside coatings are NIR optimized with no baking
Read more about it here:
http://www.asminternational.org/web/edfas/news/-/journal_content/56/10180/23558008/NEWS
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ULTRA TEC: UPGRADED ULTRACOLLIMATOR
Laser-based illumination module offers up to four times tilt alignment accuracy
Read more about it here:
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OKOS announces opening of OKOS EU
OKOS Solutions, LLC, today announced that it is opening OKOS EU Sales Office in Budapest, Hungary. In partnership with Femtonics Limited, OKOS EU showcases latest technology in Ultrasonic NDT Scanning Systems and Scanning Acoustic Microscopes (SAM). OKOS looks forward to working closely with customers in Europe.
OKOS EUTűzoltó street 59. 3rd floorBudapest, H-1094, HungaryContact person: Tamas Zalayeu@okos.comphone: +36 70 222 3022+1 571 477 7910
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EPO-TEK® 353ND-T is now ISO 10993 certified
We are happy to inform you that another product has been ISO 10993 tested and approved: Epo-Tek 353ND-T.
Epo-Tek 353ND-T is a thixotropic version of Epo-Tek 353ND. It is often used when a high temperature resistance is required.
The ISO test included the following:
- 10993-5
- 10993-6
- 10993-10
- 10993-11
Do not hesitate us if you need further information.
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Electrical Products
Resistivity Standards
- 76.2 mm, 200 mm, or 300 mm silicon wafers
- Used with 4-Point Probes, Eddy Current Gauges
ITO Sheet Resistance Standards
- 125mm x 125mm x 0.7mm
- 90% In2O3:10% SnO2 plates
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Film Thickness Products
Silicon Dioxide Standards
- Uniform layer of silicon dioxide on silicon wafers
- Used with Ellipsometers, Reflectometers, Film Monitors
Silicon Nitride Standards
- Layer of Silicon Nitride (LPCVD) on silicon wafers
- Used with Ellipsometers, Reflectometers, Film Monitors
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Dimensional Products
NanoCD Standards
- 25, 45, 70 and 110 nm Line Width
- Used with SEMs and CD-AFMs
Nanolattice Standard (NLS)
The NanoLattice Module Standard (NLSM) is a CD SEM calibration standard which enables accurate sub 0.13 μm lithography. The NanoLattice has the 0.1 μm pitch required for sub 0.13 μm SEM magnification calibration and characterization of non-linearity across the field of view.
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Contamination Standards
Absolute Contamination Standards
- Substrate Deposited Polystyrene Latex Spheres
- For use with Scanning Surface Inspection Systems (SSIS)
Edge Contamination Standards
- Edges of Substrate Deposited Polystyrene Latex Spheres
- For use with Edge Contamination Detection Systems
Reticle Contamination Standards
- Spheres deposited on photomasks / test plates
- For use with reticle and pellicle inspection systems
Silica Contamination Standards
- Substrate Deposited highly spherical Silica Spheres
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